Speedrunning 30yrs of lithography technology [video]
The author is constructing a photolithography machine for one-micron features, utilizing a UV LED and Digital Micromirror Device, in collaboration with Carnegie Mellon’s hacker Fab group, emphasizing open-source lithography.
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The video outlines the author's initiative to replicate the creation of one-micron features in integrated circuits by constructing a photolithography machine with contemporary technology. The author underscores the significance of photolithography in semiconductor manufacturing and shares insights from their previous experiences with various lithography methods. They designed a new machine utilizing CAD software and procured laser-cut components for its assembly. Modifications are being made to a Texas Instruments DLP projector development kit, which includes substituting the existing LED with a UV LED and integrating additional optical elements. Initially, the author intended to create a direct-write laser machine but pivoted to employing a Digital Micromirror Device (DMD) after collaborating with the hacker Fab group at Carnegie Mellon University. The optical setup involves projecting UV light onto the DMD, which then focuses an image onto a substrate through a microscope objective. The hacker Fab group is also engaged in open-source lithography efforts, with their advancements shared online. This project exemplifies the blend of modern technology with traditional chip-making practices, highlighting innovative strategies in photolithography.
- The author is building a photolithography machine to create one-micron features.
- Modifications include using a UV LED and a Digital Micromirror Device (DMD).
- The project involves collaboration with the hacker Fab group at Carnegie Mellon University.
- The initiative emphasizes open-source efforts in lithography.
- The project showcases innovative approaches to traditional semiconductor manufacturing techniques.
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